Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
  • Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
  • Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
  • Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
  • Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
  • Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : With a team of seasoned professionals and cutting-edge manufacturing facilities, we guarantee the consistent delivery of superior-quality wafers.
  • Wide Range of Products : From Czochralski (CZ) and Float Zone (FZ) silicon wafers to SOI and glass wafers, we provide an extensive selection tailored to your precise requirements.
  • Customization : We excel in crafting custom wafers to your exact specifications, ensuring the success of your unique project.
  • Fast Turnaround : Our efficient processes and substantial in-stock inventory allow us to deliver promptly, keeping your projects on track.
  • Global Reach : We serve customers in over 50 countries, shipping worldwide from our warehouses in China and Japan.
Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
Dummy wafers, also known as test wafers, are primarily used for experimentation and testing, distinct from standard production wafers.
Consequently, reclaimed wafers are predominantly utilized as dummy wafers (test wafers).

Dummy wafers are frequently employed in production devices to ensure initial process safety and for delivery checks and process evaluation.
Given their common usage in experimentation and testing, the size and thickness of dummy wafers are critical factors in most scenarios.
Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for TestingBoron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
Wafers processed with film deposition are referred to as film wafers.
Examples of films used include isolation films for layer separation, metal films for conductivity, and process materials like resist and protective films.
Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for TestingBoron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
Product Parameters
 

Use Reference Value for Specifications

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM Test Wafer - Precision for Critical Testing

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM Test Wafer - Large Scale Testing Excellence
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Oxide Wafer - Superior for Oxide Layer Testing
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* Please contact us for additional film types, specific film thicknesses, and custom film compositions.

At Fine Silicon Manufacturing (Shanghai) Ltd., we offer the highest quality silicon wafers at competitive prices. Silicon wafers are the cornerstone of today's semiconductor industry. Our WaferPro silicon wafers provide an exceptional balance of cost efficiency and performance.

Whether you're in need of silicon wafers for immediate purchase or looking to buy silicon wafers online, our extensive in-stock inventory includes SEMI standard silicon wafers in diameters of 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm, all ready for prompt shipping.

For custom wafer sizes or specifications beyond our standard online offerings, reach out to our expert team to meet your unique semiconductor wafer needs by leveraging our comprehensive supply chain partnerships.

Certifications

Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
Packaging & Shipping

Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
Company Profile
 
Founded in August 2008, Fine Silicon Manufacturing (Shanghai) Ltd. stands as a pioneering leader in the semiconductor industry. Nestled in the heart of Shanghai's Pudong New Area, our state-of-the-art wafer reclaim factory is dedicated to delivering exceptional quality in wafer lapping and polishing services for 6-12 inch wafers, with an impressive capacity of 50,000 pieces per month. Additionally, we proudly serve as an esteemed agent for particle-controlled test wafers, wafer film coating, and wafer thinning. Our commitment to innovation and excellence ensures that we meet and exceed the needs of our clients. Should you wish to learn more or collaborate with us, please do not hesitate to CONTACT US for further information.
Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
 
 
Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
Our Advantages

Boron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for TestingBoron Doped Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer for Testing
FAQ
 

Q: What's the way of shipping?
A: We offer a variety of reliable shipping options, including DHL, FedEx, ***, UPS, EMS, and SF, among others.
Q: How can I make a payment?
A: We accept payments via T/T (Telegraphic Transfer) and PayPal.and other methods.
Q: What's the delivery time?
A: For in-stock items, the delivery time is typically 5 working days.
For customized products, the delivery timeline ranges from 7 to 25 working days, depending on the order quantity.
Q: Can I customize the products to meet my specific needs?
A: Yes, we offer customization for materials, specifications, and optical coatings to suit your unique requirements.

Each customer's specifications are unique, and Fine Silicon Manufacturing (Shanghai) Ltd. can supply wafers that precisely match your needs.

If you don't see the specifications you require, please
to speak with a member of our experienced and knowledgeable sales staff.

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