Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
  • Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
  • Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
  • Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
  • Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
  • Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : With a team of seasoned professionals and cutting-edge manufacturing facilities, we consistently deliver wafers of the highest quality.
  • Wide Range of Products : From Czochralski (CZ) and Float Zone (FZ) silicon wafers to SOI and glass wafers, our extensive selection meets all your specific requirements.
  • Customization : We excel in producing custom wafers tailored to your exact specifications, ensuring the success of your project.
  • Fast Turnaround : Thanks to our streamlined processes and well-stocked inventory, we ensure quick delivery to keep your projects on track.
  • Global Reach : Shipping worldwide from our warehouses in China and Japan, we serve customers in over 50 countries.
Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
Dummy wafers, also known as test wafers, are primarily used for experiments and testing, distinct from general product wafers.
As a result, reclaimed wafers are mostly utilized as dummy wafers for testing purposes.

Dummy wafers enhance safety in the initial stages of production and are crucial for delivery checks and process evaluations.
Given their experimental use, the size and thickness of dummy wafers are typically critical factors.
Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High PrecisionJapanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
Wafers processed with film deposition are referred to as film wafers.
Examples of film growth include isolation films for inter-layer insulation, metal films for conductivity, and process materials like resist and protective films.
Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High PrecisionJapanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
Product Parameters
 

Reference Values for Usage

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM High-Quality Test Wafers

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM Advanced Test Wafers
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Premium Oxide Wafers
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* For further inquiries about different film types, thicknesses, and compositions, please contact us directly.

At Fine Silicon Manufacturing (Shanghai) Ltd., we offer top-tier silicon wafers at highly competitive prices. Silicon wafers are crucial to today's semiconductor technology. Our WaferPro silicon wafers provide the perfect balance of cost-effectiveness and high performance.

Whether you're in the market for silicon wafers or need to purchase them online, our extensive inventory includes SEMI standard silicon wafers in 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm diameters, all available for immediate shipping.

For custom sizes or specifications beyond our standard online offerings,reach out to our dedicated teamto address your unique semiconductor wafer needs, leveraging our vast network of supply chain partnerships.

Certifications

Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
Packaging & Shipping

Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
Company Profile
 
Fine Silicon Manufacturing(Shanghai) Ltd., founded in August 2008, stands as a pillar of precision in the silicon wafer industry. Our state-of-the-art wafer reclaim factory, located in the bustling Shanghai Pudong New Area, specializes in the lapping and polishing of 6-12 inch wafers, boasting an impressive capacity of 50,000 pieces per month. As a dedicated innovator, we're also proud agents of particle-controlled test wafer reclaim, cutting-edge wafer film coating, and precise wafer thinning services. For those seeking excellence in silicon wafer solutions, your search ends here. Please CONTACT US for more detailed information and customized solutions.
Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
 
 
Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
Our Advantages

Japanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High PrecisionJapanese Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, High Precision
FAQ
 

Q: What are the available shipping methods?
A: We offer a variety of shipping options: DHL, FedEx, ***, UPS, EMS, SF, and more.
Q: What payment methods do you accept?
A: We accept T/T and PayPal as payment methods, among others.
Q: What is the delivery time?
A: For items in stock, the delivery time is typically 5 business days.
For custom orders, the delivery time ranges from 7 to 25 business days, depending on the quantity.
Q: Can the products be customized to my specifications?
A: Absolutely! We offer customization for materials, specifications, and optical coatings to suit your specific needs.

Each customer's requirements are unique, and FSM is equipped to supply wafers that meet your exact specifications.

If you don't find the specifications you need, please
to speak with a member of our knowledgeable and experienced sales team.

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