Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : Leveraging a team of seasoned professionals and cutting-edge manufacturing facilities, we guarantee superior wafers with consistent high quality.
  • Wide Range of Products : From precise Czochralski (CZ) and high-purity Float Zone (FZ) silicon wafers to advanced SOI and versatile glass wafers, we provide a diverse array to cater to your unique requirements.
  • Customization : We excel in producing bespoke wafers tailored to your specific demands, ensuring the successful realization of your projects.
  • Fast Turnaround : Our efficient operations and extensive in-stock inventory enable rapid delivery, ensuring your projects remain on track.
  • Global Reach : With shipping capabilities spanning worldwide from our state-of-the-art facilities in China and Japan, we proudly serve clients in over 50 countries.
Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Dummy wafers (also known as test wafers) are primarily used for experimental and testing purposes, differing from conventional production wafers.
Consequently, reclaimed wafers are predominantly utilized as dummy wafers (test wafers).

Dummy wafers are frequently employed in production devices to enhance safety at the initial production stages and are used for delivery checks and process evaluations.
Because dummy wafers are frequently used for experiments and tests, their size and thickness are crucial factors in many applications.
Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron DopedTop Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Wafers processed with film deposition are referred to as film wafers.
Examples of films used (film growth) include isolation films for layer separation, metal films for conductivity, and process materials like resist and protective films.
Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron DopedTop Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Product Parameters
 

Suggested Reference Values

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM High-Precision Test Wafer

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM Premium Test Wafer
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Superior Oxide Wafer
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* Please reach out to us for details on additional film types, thicknesses, and compositions tailored to your needs.

At Fine Silicon Manufacturing(Shanghai) Ltd., we provide top-tier silicon wafers at the most competitive prices. Our silicon wafers, the cornerstone of modern semiconductor technology, offer the perfect blend of cost efficiency and superior performance.

Whether you're in the market for silicon wafers or looking to purchase online, our extensive, ready-to-ship inventory includes SEMI standard silicon wafers in diameters ranging from 2", 3", 100mm, 125mm, 150mm, 200mm, to 300mm.

For custom wafer sizes or specifications beyond our standard online offerings, connect with our dedicated team to address your unique semiconductor wafer requirements, leveraging our robust supply chain partnerships.

Certifications

Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Packaging & Shipping

Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Company Profile
 
Founded in August 2008, Fine Silicon Manufacturing(Shanghai) Ltd. stands as a beacon of excellence in the semiconductor industry. Our state-of-the-art wafer reclaim facility, nestled in the thriving Shanghai Pudong New Area, is dedicated to the meticulous lapping and polishing of 6-12 inch wafers, boasting an impressive capacity of 50K PCS/month. Additionally, we proudly serve as agents for particle-controlled test wafers reclaim, wafer film coating, and wafer thinning services. To discover how we can elevate your projects with our unrivaled expertise, please don't hesitate to CONTACT US for further information.
Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
 
 
Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Our Advantages

Top Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron DopedTop Grade Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
FAQ
 

Q: What are the available shipping methods?
A: We provide a variety of shipping options including DHL, FedEx, ***, UPS, EMS, SF, and more.
Q: What payment methods do you accept?
A: We accept T/T (Telegraphic Transfer) and PayPal.and more.
Q: What is the delivery time?
A: For products in inventory, the delivery time is approximately 5 workdays.
For customized products, the delivery time varies between 7 to 25 workdays, depending on the quantity.
Q: Can I request custom specifications for the products?
A: Absolutely! We can customize the material, specifications, and optical coating for your optical components to meet your specific needs.

Each customer's requirements are unique, and Fine Silicon Manufacturing (Shanghai) Ltd. (FSM) can supply wafers that match your exact specifications.

If you do not find the specifications you require, please
to speak with our experienced and knowledgeable sales staff.

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