Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : With a team of highly experienced professionals and cutting-edge manufacturing facilities, we consistently deliver wafers of the highest quality.
  • Wide Range of Products : From Czochralski (CZ) and Float Zone (FZ) silicon wafers to SOI and glass wafers, we provide a comprehensive selection tailored to meet your specific requirements.
  • Customization : We excel in manufacturing custom wafers to your precise specifications, guaranteeing the success of your project.
  • Fast Turnaround : Our efficient processes and well-stocked inventory allow us to ensure quick delivery, helping you keep your projects on track.
  • Global Reach : With worldwide shipping from our China and Japan warehouses, we serve customers in over 50 countries.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
Dummy wafers, also known as test wafers, are primarily used for experimentation and testing, distinct from general wafers designed for product manufacturing.
Consequently, reclaimed wafers are frequently utilized as dummy wafers (test wafers).

Dummy wafers are often employed in production devices to enhance safety at the start of the production process and are used for delivery checks and process evaluations.
Since dummy wafers are commonly used for experimentation and testing, their size and thickness are crucial factors in most instances.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon WaferSilicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
Wafers processed with film deposition are referred to as film wafers.
Examples of films utilized (growth of film) include isolation films for layer separation, metal films as conductive materials, and process materials such as resist and protective films.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon WaferSilicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
Product Parameters
 

Reference Values for Optimal Use

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM Test Wafer: Precision and Reliability

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM Test Wafer: Unmatched Quality and Performance
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Oxide Wafer: Superior Oxidation Solutions
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* For information on other film types, thicknesses, and compositions, please get in touch.

At Fine Silicon Manufacturing (Shanghai) Ltd., we offer silicon wafers of the highest quality at competitive prices. As the most widely used semiconductor material today, our WaferPro silicon wafers strike an ideal balance between cost and performance.

Whether you need silicon wafers for sale or wish to purchase silicon wafers online, our extensive in-stock inventory includes SEMI standard silicon wafers in diameters of 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm, all available for immediate shipment.

For bespoke wafer sizes or specifications beyond our standard offerings,reach out to our dedicated team to leverage our extensive supply chain partnerships and meet your unique semiconductor wafer requirements.

Certifications

Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
Packaging & Shipping

Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
Company Profile
 
Fine Silicon Manufacturing (Shanghai) Ltd., founded in August 2008, stands at the forefront of the silicon wafer industry. Our state-of-the-art wafer reclaim factory, located in the bustling Shanghai Pudong New Area, specializes in lapping and polishing wafers ranging from 6 to 12 inches, with an impressive capacity of 50K PCS/month. In addition to our core services, we proudly act as agents for particle-controlled test wafer reclaim, wafer film coating, and wafer thinning. If you are intrigued by our offerings and seek to learn more, please CONTACT US for detailed information.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
 
 
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
Our Advantages

Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon WaferSilicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Advanced CZ Method Silicon Wafer
FAQ
 

Q: What methods of shipping do you offer?
A: We are proud to offer a wide array of shipping options including DHL, FedEx, ***, UPS, EMS, SF, and more.
Q: What are the payment options available?
A: We accept T/T, PayPal,and other payment methods for your convenience.
Q: What is the delivery time?
A: For items in inventory, the delivery time is typically 5 workdays.
For customized products, the delivery time ranges from 7 to 25 workdays, depending on the order quantity.
Q: Can you customize products to meet my specific requirements?
A: Absolutely! We can tailor the material, specifications, and optical coating of your optical components to match your exact needs.

Every customer's specifications are unique, and Fine Silicon Manufacturing (Shanghai) Ltd. can provide wafers perfectly aligned with your specific demands.

If you don't see the specifications you need, please
to speak with a member of our experienced and knowledgeable sales staff for personalized assistance.

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