Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
  • Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
  • Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
  • Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
  • Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
  • Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Growth Method
CZ
Crystal Orientation
100
Dopant
Boron
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : With a seasoned team of professionals and cutting-edge manufacturing facilities, we consistently deliver wafers of unparalleled quality.
  • Wide Range of Products : From Czochralski (CZ) and Float Zone (FZ) silicon wafers to SOI and glass wafers, our extensive selection caters to your every specification.
  • Customization : We excel in crafting custom wafers tailored to your precise requirements, ensuring the success of your project.
  • Fast Turnaround : Our efficient processes and ample in-stock inventory allow us to offer swift delivery, ensuring your projects stay on track.
  • Global Reach : With warehouses in China and Japan, we serve clients in over 50 countries, delivering worldwide.
Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
Dummy wafers (also referred to as test wafers) are primarily used for experiments and testing, distinguishing them from standard product wafers.
Reclaimed wafers are predominantly utilized as dummy wafers (test wafers).

Dummy wafers are frequently employed in production devices to enhance safety at the outset of the production process, and to facilitate delivery checks and process evaluations.
Given their use in experiments and testing, the size and thickness of dummy wafers are critical factors in most applications.
Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
Wafers processed with film deposition are known as film wafers.
Examples of films used (film growth) include isolation films for layer separation, metal films for conductivity, and various process materials like resist and protective films.
Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
Product Parameters
 

Utilize Reference Values for Optimal Results

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM Precision Test Wafer

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM High-Quality Test Wafer
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Superior Oxide Wafer
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* For other film types, thicknesses, and compositions, please contact us for tailored solutions.

At Fine Silicon Manufacturing (Shanghai) Ltd, we offer the finest quality silicon wafers at highly competitive prices. Recognized as the most prevalent semiconductor material in the industry, our silicon wafers provide an unparalleled blend of cost-efficiency and performance excellence.

Whether you are searching for silicon wafers for immediate purchase or need to buy silicon wafers online, our inventory is stocked with SEMI standard silicon wafers in a range of diameters: 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm, all available for prompt shipping.

For custom wafer sizes or specifications beyond our standard online offerings,please contact our expert team to meet your unique semiconductor wafer requirements through our extensive supply chain network.

Certifications

Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
Packaging & Shipping

Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
Company Profile
 
Fine Silicon Manufacturing(Shanghai) Ltd. was established in August 2008. Our cutting-edge wafer reclaim factory, strategically located in the dynamic Shanghai Pudong New Area, specializes in the lapping and polishing of 6-12 inch wafers, boasting an impressive capacity of 50,000 pieces per month. Additionally, we serve as a premier agent for particle-controlled test wafers reclaim, wafer film coating, and wafer thinning services. If you're interested in learning more about our innovative solutions, please CONTACT US for additional information.
Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
 
 
Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
Our Advantages

Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100Crystal Oriented Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer 100
FAQ
 

Q: What are the available shipping methods?
A: We offer a broad array of shipping options including DHL, FedEx, ***, UPS, EMS, SF, and more.
Q: What payment methods do you accept?
A: We accept multiple payment options such as T/T and PayPaland others.
Q: What is the delivery time?
A: For items in inventory, the delivery time is approximately 5 workdays.
For custom products, the delivery time varies between 7 to 25 workdays, depending on the order quantity.
Q: Can I customize the products according to my requirements?
A: Absolutely! We offer customization in terms of material, specifications, and optical coating for your optical components to meet your specific needs.

Each customer's requirements are unique, and Fine Silicon Manufacturing (Shanghai) Ltd. can supply wafers that perfectly match your specifications.

If you cannot find the specifications you are looking for, please
to consult with our experienced and knowledgeable sales staff.

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