Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
  • Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
  • Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
  • Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
  • Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
  • Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Type
P-Type Semiconductor
Growth Method
CZ
Crystal Orientation
100
Dopant
Boron
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : Our team of seasoned experts, combined with cutting-edge manufacturing facilities, ensures we consistently deliver wafers of the highest quality, meeting the most stringent industry standards.
  • Wide Range of Products : Whether you need Czochralski (CZ) or Float Zone (FZ) silicon wafers, or perhaps SOI and glass wafers, our extensive range provides the perfect solution for all your specific requirements.
  • Customization : We excel in crafting custom wafers tailored precisely to your specifications, guaranteeing the success and excellence of your project.
  • Fast Turnaround : Thanks to our optimized processes and ample in-stock inventory, we ensure rapid delivery, helping you keep your projects on schedule without compromise.
  • Global Reach : With warehouses strategically located in China and Japan, we efficiently serve customers across more than 50 countries worldwide, bringing our exceptional products to your doorstep.
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Dummy wafers, also known as test wafers, are primarily used for experiments and tests and differ from general product wafers.
Reclaimed wafers are predominantly used as dummy or test wafers, offering a sustainable option for experimental applications.

Dummy wafers play a crucial role in production devices to enhance safety at the start of the production process and are essential for delivery checks and process evaluation.
When employing dummy wafers for experiments and tests, their size and thickness are critical factors that significantly impact most applications.
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Wafers that undergo film deposition are referred to as film wafers.
Films used (film growth) include isolation films for layer separation, metal films for conductivity, and process materials like resist and protective films.
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Product Parameters
 

Use reference value

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM Test Wafer: Specifically engineered for precision and reliability, our 150MM and 200MM test wafers are perfect for a wide range of applications, ensuring you achieve exceptional outcomes in your semiconductor processes.

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM Test Wafer: Experience unparalleled performance with our 300MM test wafer, designed to meet the rigorous demands of modern semiconductor testing with outstanding accuracy and durability.
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Oxide Wafer: Our 200MM and 300MM oxide wafers offer superior quality and uniformity, making them the ideal choice for advanced semiconductor applications requiring impeccable silicon oxide layers.
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* For further inquiries on tailored film types, specific film thickness, and film compositions that match your exact needs, please do not hesitate to get in touch with us.
 
Certifications
 
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Packaging & Shipping
 
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Company Profile
 
Fine Silicon Manufacturing (Shanghai) Ltd. emerged onto the scene in August 2008, bringing innovation and precision to the heart of Shanghai's Pudong New Area. Our facility, dedicated to wafer reclaim, specializes in the meticulous lapping and polishing of 6 to 12-inch wafers, boasting an impressive capacity of handling 50,000 pieces per month. However, our expertise doesn't stop there. We proudly serve as your trusted agent for particle-controlled test wafer reclaim, advanced wafer film coating, and precise wafer thinning. If you're seeking unparalleled quality and service, we invite you to CONTACT US and explore the dynamic solutions we can offer.
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
 
 
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Our Advantages
 
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
Cost-Effective Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer
FAQ
 

Q: What's the way of shipping?
A: At Fine Silicon Manufacturing (Shanghai) Ltd., we provide a variety of shipping options including DHL, FedEx, TNT, UPS, EMS, and SF, among others to ensure smooth and timely delivery.
Q: How to pay?
A: We offer convenient payment methods including T/T and PayPal, among others, to facilitate seamless transactions.
Q: What's the delivery time?
A: For items in stock, you can expect delivery within just 5 workdays.
For customized products, the delivery time ranges from 7 to 25 workdays, depending on the quantity and your specific requirements.
Q: Can I customize the products based on my need?
A: Absolutely! We specialize in customizing material, specifications, and optical coatings for your optical components, tailored precisely to meet your unique needs.

Every customer's specification is uniquely valued, and FSM is dedicated to providing wafers that meet your exact specifications.

If you do not see the specification you require, pleaseCONTACT FSMto speak with a knowledgeable and experienced member of our sales staff who can assist you in tailoring your order to perfection.

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