Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped, High Precision Silicon Wafer

• Customization: Available
• Application: Semi Standard
• Material: Compound Semiconductor
• Model NO.: 12inch
• Resistivity: 1-100Ω
• Frront Side: Polished
• Edge: Polished
• Diameter: 300±0.2mm
• Thickness: 775±25μm
• Transport Package: Semi Standard
• Specification: TBD
• Trademark: FSM
• Origin: China
• HS Code: 3818001920
• Production Capacity: 5000PCS/Month

Product Description

Product Description

 

Why Choose Fine Silicon Manufacturing?

• Unmatched Expertise : Backed by a team of seasoned professionals and cutting-edge manufacturing facilities, we ensure the delivery of consistently high-quality wafers.
• Extensive Product Line : From Czochralski (CZ) and Float Zone (FZ) silicon wafers to SOI and glass wafers, our comprehensive selection is designed to meet your precise requirements.
• Tailored Customization : We excel in producing custom wafers tailored to your exact specifications, guaranteeing the success of your project.
• Swift Turnaround : Through our streamlined processes and readily available inventory, we ensure rapid delivery to keep your projects on track.
• Expansive Global Reach : With shipping capabilities from our China and Japan warehouses, we serve customers in over 50 countries, ensuring worldwide accessibility.

Dummy wafers, also known as test wafers, are primarily utilized for experimental and testing purposes, distinguished from standard product wafers.
As such, reclaimed wafers are predominantly used as dummy wafers (test wafers).

Dummy wafers are frequently employed in production devices to enhance safety at the onset of the production process and are used for delivery checks and process form evaluations.
Given their frequent use in experimentation and testing, the size and thickness of dummy wafers are critical factors in most situations.

Wafers subjected to film deposition are referred to as film wafers.
Examples of films applied (film growth) include isolation films for layer separation, metal films for conductivity, and process materials such as resist and protective films.

Product Parameters

 

Reference Values for Utilization

Item	Specification
Diameter	150mm	200mm	300mm
Type	P/N	P/N	P/N
Notch	SEMI/JEIDA	Notch/OF	Notch
Thickness(μm)	675±25/625±25	725±25	725±25
Surface	Polished	Polished	Polished
Inside	Etched	Etched	Etched
Package	CoinRoll	CoinRoll	CoinRoll

 

150MM/200MM Test Wafers

150MM
SPEC	0.2um≤30ea
Diameter(mm)	150±0.2mm
Type	P
Olyfra length	57.5mm±2.5mm	47.5mm±2.5mm
Resistance value ( Ω·cm )	1-100
Thickness(μm)	SEMI	JEIDA
	675um±25um	675um±25um
TTV(μm)	≤30um
BOW(μm)	≤40um
WARP(μm)	≤40um
Surface impurity	≤5.0E 10 atom/cm²

 

200MM
SPEC	0.2um≤30ea	-
Diameter(mm)	200±0.2mm
Type	P
Crystal orientation	<110>±1
Notch direction
Resistance value ( Ω·cm )	1-100
Thickness(μm)	725um±25um
TTV(μm)	≤25um	≤2um
BOW(μm)	≤40um
WARP(μm)
LM	NO
Surface impurity	≤5.0E 10 atom/cm²

 

300MM Test Wafers

300MM
SPEC	0.045um≤50ea	0.065um≤50ea	0.09um<50ea	0.12um<50ea
Manufacturing method	CZ
Diameter(mm)	300±0.2mm
Type/Dopant	P/Boron
Crystal orientation	<100>±1
Notch direction
Resistance value (Ω·cm)	1-100
Thickness(μm)	775±25
TTV(μm)	≤10
BOW(μm)	≤40
WARP(μm)
LM	T7+ OCR
Surface impurity	<1 E10 Atoms/cm²

 

200MM/300MM Oxide Wafers
 

	200MM	300MM
Oxide thickness	500±25nm
Variation in oxide thickness (for one wafer)	<3%
Variation in oxide thickness (for multiple wafers)	<3%
SPEC	0.2μm≤30ea
Diameter(mm)	200±0.2mm	300±0.2mm
Type	P
Crystal orientation	<100>±1
Notch direction	<100>±1
Resistance value (Ω ·cm)	1-100
Thickness(μm)	725±25
TTV(μm)	≤25	≤10
BOW(μm)	≤40
WARP(μm)	≤40
Surface impurity	≤5.0 E10 Atom/cm²	<1 E10 Atoms/cm²

 

* For inquiries about other film types, thicknesses, and compositions, please reach out to us.

At Fine Silicon Manufacturing (Shanghai) Ltd., we offer the highest quality silicon wafers at unbeatable prices. As the cornerstone semiconductor material, our silicon wafers ensure an unparalleled balance of cost-effectiveness and high performance.

Whether you need silicon wafers for sale or prefer to purchase them online, our extensive inventory includes SEMI standard silicon wafers in diameters of 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm, all available for immediate shipping.

For bespoke wafer sizes or specifications not listed in our online offerings,to meet your unique semiconductor wafer requirements through our broad network of supply chain partners.

Certifications

Packaging & Shipping

Company Profile

 

Fine Silicon Manufacturing (Shanghai) Ltd., proudly founded in August 2008, has established itself as a pioneer in the realm of wafer reclaiming. Strategically located in the dynamic Shanghai Pudong New Area, our state-of-the-art facility specializes in the lapping and polishing of 6-12 inch wafers, boasting an impressive capacity of 50K PCS/month. As purveyors of precision, we also excel as agents in particle-controlled test wafer reclaiming, wafer film coating, and wafer thinning. Discover unparalleled quality and innovation with us. For further details and to explore potential collaborations, please CONTACT US today.

 

 

Our Advantages

FAQ

 

Q: What's the way of shipping ?
A: We offer a variety of shipping options including DHL, FedEx, ***, UPS, EMS, SF, and more.
Q: How to pay?
A: We accept multiple payment methods including T/T and PayPal. and other convenient options.
Q: What's the delivery time?
A: For inventory items: the delivery time is typically within 5 working days.
For customized products: delivery time ranges from 7 to 25 working days, depending on the quantity.
Q: Can I customize the products based on my need?
A: Absolutely! We can tailor the material, specifications, and optical coating of your optical components to meet your specific requirements.

Every customer's specification is unique, and Fine Silicon Manufacturing (Shanghai) Ltd. can supply wafers that meet your exact needs.

If you do not see the specification you require, please

to speak with a member of our experienced and knowledgeable sales staff.