Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
  • Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
  • Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
  • Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
  • Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
  • Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Growth Method
CZ
Crystal Orientation
100
Dopant
Boron
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : With a highly-skilled team of seasoned professionals and cutting-edge manufacturing facilities, we consistently deliver wafers of unparalleled quality.
  • Wide Range of Products : Offering an extensive selection, from Czochralski (CZ) and Float Zone (FZ) silicon wafers to SOI and glass wafers, we meet all your specific requirements.
  • Customization : Our specialty lies in the bespoke manufacturing of wafers tailored precisely to your specifications, ensuring the triumph of your project.
  • Fast Turnaround : Our efficient processes and readily available inventory enable expedited delivery, keeping your timelines on track.
  • Global Reach : With shipping capabilities from our warehouses in China and Japan, we serve clients in over 50 countries worldwide.
Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
Dummy wafers (also known as test wafers) are primarily utilized for experimental and testing purposes, distinguishing them from standard product wafers.
Consequently, reclaimed wafers are predominantly utilized as dummy (test) wafers.

Dummy wafers are frequently used in production setups to enhance safety at the start of the production process and are employed for delivery checks and process evaluation.
Given their frequent use in experiments and tests, the size and thickness of dummy wafers are critical factors in most applications.
Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon WaferJapanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
Wafers treated with film deposition are referred to as film wafers.
Examples of films used (film growth) include isolation films serving as inter-layer isolation materials, metal films as conductive materials, and process materials such as resist and protective films.
Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon WaferJapanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
Product Parameters
 

Use Reference Value

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM High-Quality Test Wafer

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM State-of-the-Art Test Wafer
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Premium Oxide Wafer
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* Please contact us for specialized film types, custom film thickness, and tailored film composition.

At Fine Silicon Manufacturing (Shanghai) Ltd., we offer the highest quality silicon wafers at competitive prices. Our silicon wafers are the most common semiconductor material in use today, combining exceptional cost efficiency with superior performance.

Whether you're looking to purchase silicon wafers or need to buy them online, our extensive inventory includes SEMI standard silicon wafers in diameters of 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm, all available for immediate shipping.

For custom wafer sizes or specifications beyond our standard online offerings,contact our dedicated team to fulfill your unique semiconductor wafer requirements, leveraging our extensive network of supply chain partnerships.

Certifications

Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
Packaging & Shipping

Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
Company Profile
 
Fine Silicon Manufacturing (Shanghai) Ltd., founded in August 2008, stands as a beacon of excellence in the silicon wafer industry. Strategically located in the bustling Shanghai Pudong New Area, our state-of-the-art facility specializes in the lapping and polishing of 6-12 inch wafers, boasting an impressive capacity of 50K PCS/month. Beyond our primary offerings, we also proudly serve as an agent for particle-controlled test wafer reclaim, wafer film coating, and wafer thinning. Are you interested in discovering more about how our high-purity, Japanese-quality silicon wafers can elevate your operations? We invite you to CONTACT US for further information and bespoke solutions tailored to your needs.
Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
 
 
Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
Our Advantages

Japanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon WaferJapanese Quality, Dummy Wafer, Test Wafer, Oxide Wafer, High Purity, Silicon Wafer
FAQ
 

Q: What methods of shipping are available?
A: We offer a variety of shipping options including DHL, FedEx, ***, UPS, EMS, and SF Express.
Q: What are the available payment methods?
A: We accept T/T (Telegraphic Transfer) and PayPal as payment methods,along with other convenient options.
Q: What is the delivery time?
A: If the product is in stock, the delivery time is typically 5 working days.
For customized products, the delivery time ranges from 7 to 25 working days, depending on the order quantity.
Q: Is it possible to customize the products according to my requirements?
A: Absolutely! We can tailor the material, specifications, and optical coatings of your optical components to meet your precise needs.

Each customer's specifications are unique, and Fine Silicon Manufacturing (Shanghai) Ltd. can provide wafers that align perfectly with your specific requirements.

If you don't see the specifications you need, please
to connect with a member of our highly experienced and knowledgeable sales staff.

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