Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
  • Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : With a team of seasoned professionals and cutting-edge manufacturing facilities, we ensure the delivery of consistently premium-quality wafers.
  • Wide Range of Products : From high-purity Czochralski (CZ) and Float Zone (FZ) silicon wafers to advanced SOI and glass wafers, we offer a comprehensive array tailored to meet your specific requirements.
  • Customization : We excel in creating custom wafers to your precise specifications, guaranteeing the success of your projects.
  • Fast Turnaround : Our efficient processes and extensive in-stock inventory enable us to provide rapid delivery, ensuring your projects remain on schedule.
  • Global Reach : We cater to a global clientele, shipping from our China and Japan warehouses to over 50 countries worldwide.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
Dummy wafers, also known as test wafers, are specifically designed for experimental and testing purposes, distinguishing them from standard product wafers.
As such, reclaimed wafers are predominantly used as dummy wafers (test wafers).

Dummy wafers are often employed in production devices to enhance safety at the start of the production process and are used for delivery checks and process form evaluation.
Given their frequent use in experiments and tests, the size and thickness of dummy wafers are critical factors.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, BoronSilicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
Wafers processed with film deposition are known as film wafers.
Examples of films used include isolation films for layer separation, metal films for conductivity, and process materials such as resist and protective films.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, BoronSilicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
Product Parameters
 

Reference Values for Usage

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM Premium Test Wafer

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM High-Precision Test Wafer
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Advanced Oxide Wafer
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* For inquiries about additional film types, thicknesses, and compositions, please contact us.

At Fine Silicon Manufacturing(Shanghai)Ltd., we pride ourselves on offering the highest quality silicon wafers at competitive prices. Silicon wafers are the cornerstone of modern semiconductor technology. Our WaferPro silicon wafers provide an unrivaled blend of cost-effectiveness and superior performance.

Whether you are seeking to purchase silicon wafers or looking to buy silicon wafers online, our extensive in-stock inventory features SEMI standard silicon wafers in diameters of 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm, all available for prompt shipping.

If you need custom wafer sizes or specifications beyond our standard online offerings,please contact our team to meet your unique semiconductor wafer requirements through our broad supply chain network.

Certifications

Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
Packaging & Shipping

Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
Company Profile
 
Fine Silicon Manufacturing (Shanghai) Ltd., founded in August 2008, is your premier choice for high-quality wafer reclaim services. Located in the bustling Shanghai Pudong New Area, our state-of-the-art facility specializes in lapping and polishing wafers ranging from 6 to 12 inches, boasting a robust production capacity of 50,000 pieces per month. Additionally, we proudly serve as agents for particle-controlled test wafer reclaim, advanced wafer film coating, and precise wafer thinning services. Intrigued? We invite you to CONTACT US for further details and to explore how we can meet your wafer requirements with unparalleled excellence.
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
 
 
Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
Our Advantages

Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, BoronSilicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Crystal Orientation 100, Boron
FAQ
 

Q: What shipping methods do you offer?
A: We provide multiple shipping options, including DHL, FedEx, ***, UPS, EMS, and SF Express among others.
Q: What payment methods are accepted?
A: We accept T/T and PayPal.and other methods.
Q: What is the delivery time?
A: For inventory items, the delivery time is approximately 5 workdays.
For customized products, the delivery time ranges from 7 to 25 workdays, depending on the order quantity.
Q: Can products be customized based on my requirements?
A: Absolutely! We can tailor the material, specifications, and optical coating of your optical components to meet your unique needs.

Every customer's specification is unique, and FSM is committed to supplying wafers that meet your exact requirements.

If you do not see the specifications you need, please
to speak with a member of our experienced and knowledgeable sales team.

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