CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped

Product Details
Customization: Available
Application: Semi Standard
Material: Compound Semiconductor
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  • CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
  • CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
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  • Overview
  • Product Description
  • Product Parameters
  • Certifications
  • Packaging & Shipping
  • Company Profile
  • Our Advantages
  • FAQ
Overview

Basic Info.

Model NO.
12inch
Resistivity
1-100Ω
Frront Side
Polished
Edge
Polished
Diameter
300±0.2mm
Thickness
775±25μm
Transport Package
Semi Standard
Specification
TBD
Trademark
FSM
Origin
China
HS Code
3818001920
Production Capacity
5000PCS/Month

Product Description

Product Description
 

Why Choose FSM?

  • Expertise : Leveraging a team of seasoned professionals and top-tier manufacturing facilities, Fine Silicon Manufacturing consistently delivers wafers of unparalleled quality.
  • Wide Range of Products : Whether you need Czochralski (CZ) and Float Zone (FZ) silicon wafers, or specialized SOI and glass wafers, we offer a comprehensive selection tailored to your specific requirements.
  • Customization : Our expertise lies in crafting custom wafers tailored precisely to your specifications, ensuring the highest level of project success.
  • Fast Turnaround : Thanks to our optimized processes and robust in-stock inventory, we can provide rapid delivery, keeping your timelines intact.
  • Global Reach : Shipping globally from our strategically located warehouses in China and Japan, we proudly serve clients across more than 50 countries.
CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Dummy wafers (also referred to as test wafers) are primarily utilized for experimental purposes and testing, distinguishing them from standard production wafers.
Reclaimed wafers are predominantly used as dummy wafers (test wafers).

Dummy wafers play a critical role in production equipment to enhance safety at the onset of the production process and are also used for delivery checks and process evaluation.
Given their frequent use in experimentation and testing, the size and thickness of dummy wafers are crucial factors.
CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron DopedCZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Wafers subjected to film deposition are termed film wafers.
Examples of films used include isolation films for layer separation, metal films for conductivity, and various process materials like resist and protective coatings.
CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron DopedCZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Product Parameters
 

Use Reference Value

Item Specification
Diameter 150mm 200mm 300mm
Type P/N P/N P/N
Notch SEMI/JEIDA Notch/OF Notch
Thickness(μm) 675±25/625±25 725±25 725±25
Surface Polished Polished Polished
Inside Etched Etched Etched
Package CoinRoll CoinRoll CoinRoll
 

150MM/200MM Test Wafer

150MM
SPEC 0.2um≤30ea
Diameter(mm) 150±0.2mm
Type P
Olyfra length 57.5mm±2.5mm 47.5mm±2.5mm
Resistance value ( Ω·cm ) 1-100
Thickness(μm) SEMI JEIDA
675um±25um 675um±25um
TTV(μm) ≤30um
BOW(μm) ≤40um
WARP(μm) ≤40um
Surface impurity ≤5.0E 10 atom/cm²
 
200MM
SPEC 0.2um≤30ea -
Diameter(mm) 200±0.2mm
Type P
Crystal orientation <110>±1
Notch direction
Resistance value ( Ω·cm ) 1-100
Thickness(μm) 725um±25um
TTV(μm) ≤25um ≤2um
BOW(μm) ≤40um
WARP(μm)
LM NO
Surface impurity ≤5.0E 10 atom/cm²
 
300MM Test Wafer
300MM
SPEC 0.045um≤50ea 0.065um≤50ea 0.09um<50ea 0.12um<50ea
Manufacturing method CZ
Diameter(mm) 300±0.2mm
Type/Dopant P/Boron
Crystal orientation <100>±1
Notch direction
Resistance value (Ω·cm) 1-100
Thickness(μm) 775±25
TTV(μm) ≤10
BOW(μm) ≤40
WARP(μm)
LM T7+ OCR
Surface impurity <1 E10 Atoms/cm²
 
200MM/300MM Oxide Wafer
 
  200MM 300MM
Oxide thickness 500±25nm
Variation in oxide thickness
(for one wafer)
<3%
Variation in oxide thickness
(for multiple wafers)
<3%
SPEC 0.2μm≤30ea
Diameter(mm) 200±0.2mm 300±0.2mm
Type P
Crystal orientation <100>±1
Notch direction <100>±1
Resistance value (Ω ·cm) 1-100
Thickness(μm) 725±25
TTV(μm) ≤25 ≤10
BOW(μm) ≤40
WARP(μm) ≤40
Surface impurity ≤5.0 E10 Atom/cm² <1 E10 Atoms/cm²
 
* Please contact us for inquiries about other film types, thicknesses, and compositions.

At Fine Silicon Manufacturing, we offer premium quality silicon wafers at market-leading prices. As the most widely used semiconductor material today, our silicon wafers from WaferPro strike the perfect balance between cost-efficiency and high performance.

Whether you're searching for silicon wafers for sale or need to purchase them online, our extensive inventory includes SEMI standard silicon wafers in sizes 2", 3", 100mm, 125mm, 150mm, 200mm, and 300mm, all available for immediate shipping.

For custom wafer sizes or specifications beyond our standard offerings,contact our dedicated team to meet your unique semiconductor wafer needs through our strong supply chain network.

Certifications

CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Packaging & Shipping

CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Company Profile
 
Fine Silicon Manufacturing(Shanghai) Ltd., founded in August 2008, stands as a pinnacle in the silicon wafer reclamation industry. Based in the thriving heart of Shanghai's Pudong New Area, our state-of-the-art facility specializes in the lapping and polishing of 6-12 inch wafers, boasting a robust capacity of 50,000 pieces per month. Additionally, we proudly serve as agents for particle-controlled test wafer reclamation, wafer film coating, and wafer thinning services. To explore how we can meet your silicon wafer needs, we invite you to CONTACT US for further details.
CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
 
 
CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
Our Advantages

CZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron DopedCZ Growth Silicon Wafer, Dummy Wafer, Test Wafer, Oxide Wafer, Boron Doped
FAQ
 

Q: What's the way of shipping?
A: We offer flexible shipping options including DHL, FedEx, ***, UPS, EMS, SF, and more.
Q: How can I make a payment?
A: We accept T/T and PayPal. and other convenient payment methods.
Q: What is the delivery time?
A: For items in stock, the delivery time is approximately 5 workdays.
For custom orders, delivery ranges from 7 to 25 workdays depending on the quantity required.
Q: Can I customize the products based on my needs?
A: Absolutely! We can tailor the material, specifications, and optical coating of your optical components to meet your precise requirements.

Every customer's specifications are unique, and Fine Silicon Manufacturing (Shanghai) Ltd. can supply wafers that precisely meet your exact needs.

If you do not see the specifications you require, please
to speak with a member of our experienced and knowledgeable sales staff for personalized assistance.

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